Method of growing nitride semiconductor material

Details Method of growing nitride semiconductor material Method of growing nitride semiconductor material

2008-01-15

2009-10-27

Nhu, David (Department: 2895)

Semiconductor device manufacturing: process

Coating with electrically or thermally conductive material

To form ohmic contact to semiconductive material

C438S235000, C257SE21053, C257SE21126, C257SE21127, C257SE21352, C257SE21372

Reexamination Certificate

active

07608532

ABSTRACT:
A method of growing nitride semiconductor material and particularly a method of growing Indium nitride is disclosed can increase surface flatness of a nitride semiconductor material and decrease density of V-defects therein. Further, the method can increase light emission efficiency of a quantum well or quantum dots of the produced LED as well as greatly increase yield. The method is also applicable to the fabrications of electronic devices made of nitride semiconductor material and diodes of high breakdown voltage for rectification. The method can greatly increase surface flatness of semiconductor material for HBT, thereby increasing quality of the produced semiconductor devices.

REFERENCES:
patent: 6440214 (2002-08-01), Hooper et al.
patent: 6806115 (2004-10-01), Koide et al.
patent: 7182811 (2007-02-01), Ishida
patent: 7235818 (2007-06-01), Kim et al.
patent: 7358112 (2008-04-01), Barnes et al.

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