Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – On insulating substrate or layer
Patent
1996-11-13
1998-10-13
Bowers, Jr., Charles L.
Semiconductor device manufacturing: process
Formation of semiconductive active region on any substrate
On insulating substrate or layer
117104, C30B 2940
Patent
active
058211551
ABSTRACT:
A method of doping a compound semiconductor layer n-type during epitaxial growth of the compound semiconductor layer includes supplying source materials including respective elements of a compound semiconductor material to a heated monocrystalline substrate, epitaxially growing a layer of the compound semiconductor material on the heated substrate and, simultaneously, supplying SiI.sub.4 as a dopant source material including silicon to the heated substrate, incorporating silicon as a dopant impurity producing n-type conductivity into the compound semiconductor layer during the epitaxial growth.
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Izumi et al., "Selective Area Chemical Beam Epitaxial Regrowth Of Si-Doped GaAs And InP By Using Silicon Tetraoxide For HFET Application", Ninth Annual Conference on Molecular Beam Epitaxy Aug. 1996, Malibu California.
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Izumi Shigekazu
Uneme Yutaka
Bowers Jr. Charles L.
Christianson Keith
Mitsubishi Denki & Kabushiki Kaisha
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