Method of generating development environment for developing...

Details Method of generating development environment for developing... Method of generating development environment for developing...

2007-01-23

2007-01-23

Do, Thuan (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Nanotechnology related integrated circuit design

C716S030000, C716S030000, C703S014000

Reexamination Certificate

active

10197891

ABSTRACT:
A system LSI development environment generating method includes a compiler customizing section which generates a compiler from a configuration designation file, an assembler customizing section which generates an assembler, and a simulator generating section which generates a simulator. The configuration designation file contains a designation of hardware which executes instructions.

REFERENCES:
patent: 6205541 (2001-03-01), Tran et al.
patent: 6477683 (2002-11-01), Killian et al.
patent: 6634017 (2003-10-01), Matsui et al.
patent: 2006/0195828 (2006-08-01), Nishi et al.
patent: 2869379 (1998-12-01), None
patent: 2003-518280 (2003-06-01), None
patent: 2002-0021081 (2002-03-01), None
Kazuyoshi Kohno, et al., “A New Verification Methodology for Complex Pipeline Behavior”, Proceedings of the Design Automation Conference, Jun. 18-22, 2001, (6 pages).
Mitsuo Saito, “Progress of Semiconductor Technology and System on Chip”, Trend, vol. 57, No. 1, Jan. 1, 2002, p. 38-42.
Hiroyuki Takano, et al., “A 4GOPS 3 Way-VLIW Image Recognition Processor Based on a Configurable Media Processor” IEICE Trans. Electron, vol. E85-C, No. 2, Feb. 2002, pp. 347-351.
U.S. Appl. No. 09/865,289, filed May 29, 2001.
U.S. Appl. No. 10/208,839, filed Aug. 1, 2002.

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