Method of forming thin-film recording medium

Details Method of forming thin-film recording medium Method of forming thin-film recording medium

1991-03-14

1991-10-15

Dean, H.

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

C21D 104, C23C 1500

Patent

active

050572008

ABSTRACT:
A high-coercivity thin-film magnetic recording medium, and method of producing the medium, is disclosed. The medium has a sputtered chromium underlayer, preferably about 300-1,000 .ANG. thick, and a sputtered magnetic layer, preferably about 200-800 .ANG. thick, composed of an alloy containing between 70-80% cobalt, 10-20% chromium, 3-20% platinum, and 2-10% tantalum, formed on the chromium underlayer. The medium is characterized by high coercivity, resolution, amplitude and loop squareness value, and low bit shift.

REFERENCES:
patent: 4236946 (1980-02-01), Aboaf et al.
patent: 4576700 (1986-03-01), Kadokura et al.

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