Method of forming stable images in electron beam writable glass

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask

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430 13, 430 14, 430 19, 430270, 430296, 430321, 428410, 428426, 65 3011, G03C 500, G11B 700

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active

051148137

ABSTRACT:
Silicate glasses are provided which when exposed to a silver ion exchange surface treatment are writable with electron beams. These glasses contain OD agents and do not require elements having 1-4 d-electrons in the atomic state.

REFERENCES:
patent: 4191547 (1980-03-01), Wu
patent: 4297417 (1981-10-01), Wu
patent: 4337295 (1982-06-01), Rittler
patent: 4567104 (1986-01-01), Wu
patent: 4670366 (1987-06-01), Wu
patent: 4726981 (1988-02-01), Pierson et al.
patent: 4798768 (1989-01-01), Oversluizen et al.
patent: 4894303 (1990-01-01), Wu
patent: 4897509 (1990-01-01), Holleran et al.
patent: 4979975 (1990-12-01), Borrelli et al.

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