Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1990-02-08
1992-05-19
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
430 13, 430 14, 430 19, 430270, 430296, 430321, 428410, 428426, 65 3011, G03C 500, G11B 700
Patent
active
051148137
ABSTRACT:
Silicate glasses are provided which when exposed to a silver ion exchange surface treatment are writable with electron beams. These glasses contain OD agents and do not require elements having 1-4 d-electrons in the atomic state.
REFERENCES:
patent: 4191547 (1980-03-01), Wu
patent: 4297417 (1981-10-01), Wu
patent: 4337295 (1982-06-01), Rittler
patent: 4567104 (1986-01-01), Wu
patent: 4670366 (1987-06-01), Wu
patent: 4726981 (1988-02-01), Pierson et al.
patent: 4798768 (1989-01-01), Oversluizen et al.
patent: 4894303 (1990-01-01), Wu
patent: 4897509 (1990-01-01), Holleran et al.
patent: 4979975 (1990-12-01), Borrelli et al.
Clement Marc
Grabowski Danuta
Hayden Joseph S.
Heming Martin
Holzel Eva
Bowers Jr. Charles L.
McPherson John A.
Schott Glass Technologies Inc.
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