Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Patent
1997-10-29
1999-08-31
Duda, Kathleen
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
430318, G03F 700
Patent
active
059452579
ABSTRACT:
A method is disclosed for forming resistors that are low cost, easy to manufacture and substantially within 5 percent of their desired value. In one aspect of the method, an electrically resistive material, such as nickel, is deposited directly on an insulating layer, such as a substrate. A conductive material, such as copper, is then deposited on the resistive material. Using photo-imaging, signal traces are formed in the conductive and resistive materials. A resistor is created by forming a gap in the conductive material at a location where the resistor is desired. Current is thereby forced to flow through the resistive material at the location of the gap.
REFERENCES:
patent: 3808576 (1974-04-01), Castonguay et al.
patent: 3864180 (1975-02-01), Barraclough
patent: 3904461 (1975-09-01), Estep et al.
patent: 4808967 (1989-02-01), Rice et al.
patent: 4820547 (1989-04-01), Lindsay et al.
patent: 4888574 (1989-12-01), Rice et al.
patent: 4892776 (1990-01-01), Rice
patent: 5184108 (1993-02-01), Bloom et al.
patent: 5347258 (1994-09-01), Howard et al.
Duda Kathleen
Sequent Computer Systems, Inc.
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