Method of forming resist pattern

Details Method of forming resist pattern Method of forming resist pattern

2007-09-18

2011-10-25

Walke, Amanda C. (Department: 1722)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

C430S331000, C430S913000, C430S927000, C430S322000, C430S273100

Reexamination Certificate

active

08043795

ABSTRACT:
Disclosed is a method of forming a resist pattern, including: applying a positive resist composition on a support1to form a first resist film2; selectively exposing the first resist film2through a first mask pattern, and developing it to form a first resist pattern3; applying a negative resist composition including an organic solvent (S″) containing an alcohol-based organic solvent on the support1that the first resist pattern3is formed, thereby forming a second resist film6; and selectively exposing the second resist film6through a second mask pattern, and developing it to form a resist pattern denser than the first resist pattern3.

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