Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step
Patent
1988-12-29
1989-10-24
Powell, William A.
Adhesive bonding and miscellaneous chemical manufacture
Delaminating processes adapted for specified product
Delaminating in preparation for post processing recycling step
156647, 156654, 1566591, 156667, 29603, B44C 122, C03C 1500, C03C 2506
Patent
active
048759708
ABSTRACT:
A method of forming, on a surface of a Mn-Zn ferrite single crystal, a recessed portion which has a predetermined cross sectional profile and at least one straight ridge each of which defines a boundary in the profile. An etching mask is formed on the surface of the ferrite single crystal, so as to provide the recessed portion by etching such that each straight edge of the profile lies in a (100) or (110) plane of the ferrite single crystal which is perpendicular to the surface on which the etching mask is formed. The ferrite single crystal with the etching mask in exposed to an aqueous solution which substantially consists of water and the balance consisting principally of phosphoric acid, whereby the surface of the ferrite single crystal is chemically etched, so as to produce the recessed portion such that an inclined surface is formed so as to extend parallel to the straight ridge, and such that the straight ridge defines an edge of the inclined surface.
REFERENCES:
patent: 4751779 (1988-06-01), Nagatomo et al.
"Narrow Track Magnetic Head Fabricated by Means of Ion Etching Method", Takuji Nakanishi et al., MR771-, May 25, 1987, pp. 1-10.
"Silicon as a Mechanical Material", Kurt E. Petersen, Proceedings of the IEEE, vol. 70, No. 5, May 1982, pp. 420-457.
Fukuda Naoya
Suzuki Miki
Takeya Fuminori
NGK Insulators Ltd.
Powell William A.
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