Method of forming recessed profile on ferrite single crystal by

Details Method of forming recessed profile on ferrite single crystal by Method of forming recessed profile on ferrite single crystal by

1988-12-29

1989-10-24

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156647, 156654, 1566591, 156667, 29603, B44C 122, C03C 1500, C03C 2506

Patent

active

048759708

ABSTRACT:
A method of forming, on a surface of a Mn-Zn ferrite single crystal, a recessed portion which has a predetermined cross sectional profile and at least one straight ridge each of which defines a boundary in the profile. An etching mask is formed on the surface of the ferrite single crystal, so as to provide the recessed portion by etching such that each straight edge of the profile lies in a (100) or (110) plane of the ferrite single crystal which is perpendicular to the surface on which the etching mask is formed. The ferrite single crystal with the etching mask in exposed to an aqueous solution which substantially consists of water and the balance consisting principally of phosphoric acid, whereby the surface of the ferrite single crystal is chemically etched, so as to produce the recessed portion such that an inclined surface is formed so as to extend parallel to the straight ridge, and such that the straight ridge defines an edge of the inclined surface.

REFERENCES:
patent: 4751779 (1988-06-01), Nagatomo et al.
"Narrow Track Magnetic Head Fabricated by Means of Ion Etching Method", Takuji Nakanishi et al., MR771-, May 25, 1987, pp. 1-10.
"Silicon as a Mechanical Material", Kurt E. Petersen, Proceedings of the IEEE, vol. 70, No. 5, May 1982, pp. 420-457.

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