Method of forming planarized, reusable calibration grids

Details Method of forming planarized, reusable calibration grids Method of forming planarized, reusable calibration grids

1991-05-23

1992-12-08

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156645, 156647, 156656, 156657, 1566591, 156662, H01L 21306, B44C 122, C23F 100, C03C 1500

Patent

active

051694883

ABSTRACT:
An improved structure for electron beam lithography grids and a method of fabricating such grids yields calibration grids having grid lines coplanar with the surface of the grid body and laterally supported by grooves formed in the grid body and which can also be cleaned after contamination by outgassing resist during use by virtue of the provision of such lateral support for the grid lines. The grid exhibits improved accuracy due to the technique of fabrication of the grooves. The invention thus allows the electron beam lithography process to be conducted with less expense and at greater speed. The improved accuracy of the calibration grid also permits integrated circuits and masks used in the fabrication of such devices to be designed more flexibly and fabricated at reduced cost and improved integration densities and manufacturing yields.

REFERENCES:
patent: 3579057 (1971-05-01), Stoller
patent: 3982837 (1976-09-01), Cummins
patent: 4056730 (1977-11-01), Davis et al.
patent: 4233091 (1980-11-01), Kawabe
patent: 4390789 (1983-06-01), Smith et al.
patent: 4397937 (1983-08-01), Clecak et al.
patent: 4467211 (1984-08-01), Smith et al.
patent: 4728799 (1988-03-01), Gordon et al.
IBM Technical Disclosure Bulletin, vol. 14, No. 2, Jul. 1971, pp. 417-418, "Fabricating Shaped Grid and Aperture Holes" by R. A. Leone and C. H. Ting.
"Correction of Non-Linear Distortion In a Direct Exposure Electron Beam System" by H. Engelke, J. F. Loughran, M. S. Michall & P. M. Ryan; IBM J. Res. Develop., Nov. 1977, pp. 506-513.
"Registration Mark Detection for Electron-Beam Lithography-EL1 System" by Donald E. Davis, IBM J. Res. Develop.; vol. 24, No. 5, Sep. 1980.

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