Abrading – Precision device or process - or with condition responsive... – With indicating
Patent
1998-08-17
2000-01-18
Eley, Timothy V.
Abrading
Precision device or process - or with condition responsive...
With indicating
451 36, B24B 4900
Patent
active
060153334
ABSTRACT:
A method of chemical mechanical polishing (CMP) useful in the manufacture of integrated circuits is disclosed. Waste slurry is examined and its conductivity, luminescence, or particulate mass evaluated to determine an endpoint for the CMP operation.
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Eley Timothy V.
Lucent Technologies - Inc.
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