Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Patent
1981-04-02
1983-09-06
Anderson, Bruce C.
Radiant energy
Irradiation of objects or material
Irradiation of semiconductor devices
H05K 306
Patent
active
044031513
ABSTRACT:
Desired portions of the positive-type photoresist film are irradiated with an electron beam, and regions including at least the regions irradiated with the electron beam are further irradiated with ultraviolet light, followed by developing.
The photosensitive radicals are destroyed in the regions which are irradiated with the electron beam. Therefore, the solubility of the photoresist film is not increased even when it is irradiated with ultraviolet light, and resist patterns are formed by developing.
REFERENCES:
patent: 4099062 (1978-07-01), Kitcher
patent: 4298803 (1981-11-01), Matsuura et al.
Maruyama Yozi
Mochiji Kozo
Murai Fumio
Okazaki Shinji
Anderson Bruce C.
Berman Jack I.
Hitachi , Ltd.
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