Method of forming patterned polyimide films

Details Method of forming patterned polyimide films Method of forming patterned polyimide films

1992-02-18

1995-11-28

Duda, Kathleen

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

430317, 430324, 430329, 430330, G03F 726

Patent

active

054706939

ABSTRACT:
A method of producing patterned polyimide films using wet development of polyimide precursors through a photoresist mask is disclosed. Low thermal coefficient of expansion (TCE) polyimide patterns are formed by starting with a polyamic acid precursor, typically, that derived from 3,3',4,4'-biphenyltetracarboxylic acid dianhydride-p-phenylenediamine (BPDA-PDA). Polyimide patterns are generated with complete retention of the intrinsic properties of the polyimide backbone chemistry and formation of metallurgical patterns in low TCE polyimide dielectric.

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R. Rubner, A Photopolymer--The Direct Way to Polyimide Patterns, Photographic Science and Engineering, 1979, pp. 303-309.

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