Method of forming patterned nickel and doped nickel films...

Details Method of forming patterned nickel and doped nickel films... Method of forming patterned nickel and doped nickel films...

2005-03-15

2005-03-15

Powell, William A. (Department: 1765)

Etching a substrate: processes

Masking of a substrate using material resistant to an etchant

C216S049000, C216S100000, C438S754000

Reexamination Certificate

active

06866791

ABSTRACT:
The process of derivatization and patterning of surfaces, and more particularly to the formation of self-assembled molecular monolayers on metal oxide surfaces using microcontact printing and the derivative articles produced thereby.

REFERENCES:
patent: 5725788 (1998-03-01), Maracas et al.
patent: 5900160 (1999-05-01), Whitesides et al.

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