Method of forming partial reverse active mask

Details Method of forming partial reverse active mask Method of forming partial reverse active mask

2006-02-21

2006-02-21

Barreca, Nicole (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

C430S311000, C430S313000, C430S314000, C430S316000, C438S296000, C438S424000, C438S427000, C438S692000

Reexamination Certificate

active

07001713

ABSTRACT:
A method of forming a partial reverse active mask. A mask pattern comprising a large active region pattern with an original dimension and a small active region pattern is provided. The large active region pattern and the small active region pattern are shrunk until the small active region pattern disappears. The large active region pattern enlarged to a dimension slightly smaller than the original dimension.

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