Coating apparatus – Gas or vapor deposition
Reexamination Certificate
2005-04-26
2005-04-26
Lund, Jeffrie R. (Department: 1763)
Coating apparatus
Gas or vapor deposition
C118S724000, C118S725000, C392S480000
Reexamination Certificate
active
06884295
ABSTRACT:
This invention is an oxynitride film forming method including: a reaction chamber heating step of heating a reaction chamber to a predetermined temperature, the reaction chamber containing an object to be processed; a gas heating step of heating a process gas to a temperature not lower than a reaction temperature at which an oxynitride film can be formed, the process gas consisting of dinitrogen oxide gas; and a film forming step of forming an oxynitride film on the object to be processed by supplying the heated process gas into the heated processing chamber. The temperature to which the reaction chamber is heated in the reaction chamber heating step is set at a temperature below a temperature at which the process gas undergoes a reaction.
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Ishii Katsutoshi
Miura Kazutoshi
Lund Jeffrie R.
Smith , Gambrell & Russell, LLP
Tokyo Electron Limited
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