Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Patent
1997-10-08
1999-02-23
Baxter, Janet
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
430323, 430313, 430329, G03C 500
Patent
active
058741992
ABSTRACT:
Ball limited metallurgy is used in conjunction with defining a solder deposit volume using an aperture in a resist layer and reflow of electroplated solder materials deposited in that aperture, possibly with planarization after deposition to enhance volume accuracy, to develop solder deposits extending up to 10 .mu.m or more above the surface on which solder is deposited. Such deposits can be made at fine pitch and provide solder connections of high reliability even when the distance which must be bridged by the solder connection is not easily or reliably regulated.
REFERENCES:
patent: 4661375 (1987-04-01), Thomas
patent: 5024372 (1991-06-01), Altman et al.
patent: 5346118 (1994-09-01), Degani et al.
patent: 5376584 (1994-12-01), Agarwala
patent: 5381848 (1995-01-01), Trabucco
patent: 5381946 (1995-01-01), Koopman et al.
patent: 5635337 (1997-06-01), Bartha et al.
patent: 5789142 (1998-08-01), Brown et al.
Deligianni Hariklia
Hsioh-Lien Ma William
Ahsan, Esq. Aziz
Ashton Rosemary
Baxter Janet
International Business Machines - Corporation
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