Method of forming organic thin film and method of...

Semiconductor device manufacturing: process – Making passive device – Resistor

Reexamination Certificate

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C438S149000, C438S781000, C438S782000, C257SE21051, C257SE21094, C257SE21266, C257SE21267, C257SE21278, C257SE21400, C257SE21411

Reexamination Certificate

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07855121

ABSTRACT:
Provided are a method of forming an organic semiconductor thin film and a method of manufacturing a semiconductor device using the. According to example embodiments, a method of forming an organic semiconductor thin film at least may include exposing a lower substrate coated with an organic semiconductor solution using a method of generating a shearing stress to the portion of the lower substrate coated with the organic semiconductor solution. A guide structure may be formed adjacent to the organic semiconductor solution.

REFERENCES:
patent: 6203933 (2001-03-01), Nakaya et al.
patent: 7061010 (2006-06-01), Minakata
patent: 2007/0243658 (2007-10-01), Hirai et al.
patent: 2007/0262308 (2007-11-01), Song
patent: 2007/0272653 (2007-11-01), Wakita
patent: 2009/0111210 (2009-04-01), Obuchi et al.

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