Method of forming microporous membranes

Details Method of forming microporous membranes Method of forming microporous membranes

2006-02-14

2006-02-14

Hassanzadeh, Parviz (Department: 1763)

Etching a substrate: processes

Nongaseous phase etching of substrate

Irradiating, ion implanting, alloying, diffusing, or...

C216S056000

Reexamination Certificate

active

06998063

ABSTRACT:
A method of forming a microporous fluoropolymer membrane, comprising the steps of:irradiating a sheet of fluoropolymer at a dosage level below the rupture energy of the carbon-to-fluorine (C—F) bonds of the fluoropolymer, but sufficient to rupture carbon-to-carbon (C—C) bonds; andexposing the sheet of fluoropolymer to an etchant for a period of time sufficient to etch away disrupted atoms and molecules, wherein continuous micropassages are formed through the sheet.

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