Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Patent
1995-11-29
1997-10-21
Young, Christopher G.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
430328, G03F 736, G03F 738
Patent
active
056795009
ABSTRACT:
A resist film is formed on a semiconductor substrate by using a chemical amplification resist which generates an acid in response to the radiation of KrF excimer laser light and which reacts with the acid. If the resist film is irradiated with the KrF excimer laser light through a mask, the acid is generated in the surface of an exposed portion of the resist film, so that the surface of the exposed portion is made hydrophilic by the acid. If water vapor is supplied to the surface of the resist film, water is diffused from the surface of the exposed portion into a deep portion. If vapor of methyltriethoxysilane is sprayed onto the surface of the resist film in air at a relative humidity of 95%, an oxide film with a sufficiently large thickness is selectively formed on the surface of the exposed portion.
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patent: 5215867 (1993-06-01), Stillwagon et al.
patent: 5278029 (1994-01-01), Shirai et al.
Schellekens et al., "Single Level Dry Developable Resist Systems . . . ", SPIE 1989, pp. 1-9.
Endo Masayuki
Matsuo Takahiro
Sasago Masaru
Yamashita Kazuhiro
Matsushita Electric - Industrial Co., Ltd.
Young Christopher G.
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