Method of forming metal line

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device

Reexamination Certificate

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Details

C430S320000, C430S322000, C430S323000, C204S192150, C204S192360, C204S192170, C216S058000

Reexamination Certificate

active

07005239

ABSTRACT:
A method of forming a metal line includes the steps of forming a metal layer on a substrate in a chamber while maintaining a chamber pressure for a plasma to be equal to or smaller than 0.8 Pa, and coating a photoresist on the metal layer.

REFERENCES:
patent: 6383947 (2002-05-01), Besser et al.
patent: 10-335452 (1998-12-01), None
patent: 197127 (1999-02-01), None

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