Method of forming interlayer insulating film

Details Method of forming interlayer insulating film Method of forming interlayer insulating film

1997-08-28

1999-11-23

Niebling, John F.

Semiconductor device manufacturing: process

Coating with electrically or thermally conductive material

To form ohmic contact to semiconductive material

438743, H01L 214763

Patent

active

059899980

ABSTRACT:
A material containing, as a main component, an organic silicon compound represented by the following general formula:

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