Method of forming insulating layer and method of fabricating...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – On insulating substrate or layer

Reexamination Certificate

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Details

C438S151000, C438S152000, C438S153000, C438S164000

Reexamination Certificate

active

07118945

ABSTRACT:
A method of forming an insulating layer including preparing a substrate and depositing an insulating layer on the substrate such that density of a top portion of the insulating layer is different from that of a bottom portion of the insulating layer.

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patent: 6770515 (2004-08-01), Makita et al.
patent: 2002/0074548 (2002-06-01), Lee et al.
patent: 7-130731 (1995-05-01), None
patent: 10-173052 (1998-06-01), None
patent: 2000-3505 (2000-01-01), None

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