Method of forming film by plasma CVD

Details Method of forming film by plasma CVD Method of forming film by plasma CVD

1993-03-29

1994-07-12

Pianalto, Bernard

Coating processes

Direct application of electrical, magnetic, wave, or...

Plasma

427128, 427131, 4272481, 427294, B05D 306

Patent

active

053287371

ABSTRACT:
A method of forming a film on a substrate by plasma CVD, comprising the steps of: providing a discharge tube in a vacuum chamber; providing a partition wall around the discharge tube; evacuating space between the discharge tube and the partition wall to vacuum; providing the substrate at a position confronting the discharge tube; and effecting plasma discharge in the discharge tube.

REFERENCES:
patent: 4645977 (1987-02-01), Kurokawa et al.

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