Method of forming chemically amplified resist pattern and manufa

Details Method of forming chemically amplified resist pattern and manufa Method of forming chemically amplified resist pattern and manufa

1995-12-05

1998-01-13

Lesmes, George F.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

430311, 430330, 430325, 430326, 4302731, 4302711, G03C 500

Patent

active

057077843

ABSTRACT:
A chemically amplified resist pattern is formed by applying chemically amplified resist, forming thereafter a layer of an amorphous polyolefines substance thereon, then exposing the chemically amplified resist, and furthermore, developing the chemically amplified resist after removing the amorphous polyolefines substance.

REFERENCES:
patent: 4647598 (1987-03-01), Yada et al.
patent: 5178989 (1993-01-01), Heller et al.
patent: 5326675 (1994-07-01), Niki et al.
Oikawa et al. Effect of using a resin coating on KrF chemically amplified positive resists, Proc. SPIE-Int. Soc. Opt. Eng. (1993), vol. 1925, pp. 92-100.

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