Method of forming an oxide insulating film

Details Method of forming an oxide insulating film Method of forming an oxide insulating film

1991-11-15

1997-04-22

Nguyen, Nam

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20419222, 20419223, 438151, 438788, 438910, C23C 1434

Patent

active

056226071

ABSTRACT:
A process for fabricating films improved in interface characteristics, which comprises depositing an oxide insulating film by sputtering under an irradiation of a light in an atmosphere comprising an oxidative gas at an amount larger than that of an inactive gas is disclosed. Particularly, a light having a wavelength of 300 nm or shorter is used for the irradiation.

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The Random House College Dictionary, Revised Ed., p. 716.

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