Method of forming an interlayer insulating film having a...

Details Method of forming an interlayer insulating film having a... Method of forming an interlayer insulating film having a...

2011-05-24

2011-05-24

Chen, Bret (Department: 1715)

Coating processes

Direct application of electrical, magnetic, wave, or...

Plasma

C427S579000, C427S255290, C427S255370

Reexamination Certificate

active

07947338

ABSTRACT:
In a method of forming an interlayer insulating film by plasma CVD, an organic siloxane compound including one or more silicon atoms each having at least three or more units each represented by a general formula, —O—Si(R1R2)—OR3(wherein R1and R2are the same as or different from each other and are a methyl group, an ethyl group or a propyl group, and R3is the same as or different from R1and R2and is a methyl group, an ethyl group, a propyl group or a phenyl group) is used as a raw material.

REFERENCES:
patent: 6387824 (2002-05-01), Aoi
patent: 6440876 (2002-08-01), Wang et al.
patent: 6602802 (2003-08-01), Aoi
patent: 2004/0195660 (2004-10-01), Hamada et al.
patent: 2004/0216641 (2004-11-01), Hamada et al.
patent: 2007/0178319 (2007-08-01), Hamada et al.
patent: 2000-349084 (2000-12-01), None
patent: 2004-161877 (2004-06-01), None
patent: 2004-292643 (2004-10-01), None
Liu, Po-Tsun et al., “Improvement in Integration Issues for Organic Low-k Hybrid-Organic-Siloxane-Polymer”. Journal of the Electrochemical Society, 148 (2) F30-F34 (2001).
Japanese Office Action, with English translation, issued in Japanese Patent Application No. 2005-184247, mailed Oct. 5, 2010.

Affiliated with

Also associated with

Rating

Method of forming an interlayer insulating film having a... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of forming an interlayer insulating film having a..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of forming an interlayer insulating film having a... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2707006