Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Reexamination Certificate
2006-08-29
2006-08-29
McDonald, Rodney G. (Department: 1753)
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
C204S192320, C427S523000, C427S524000, C427S529000, C216S066000
Reexamination Certificate
active
07097745
ABSTRACT:
A method of forming a tunneling magnetoresistive head begins by forming a tunneling magnetoresistive stack having a tunnel barrier. An air bearing surface is formed of the tunneling magnetoresistive stack. The air bearing surface is ion etched causing a deficiency of a constituent in a portion of the tunnel barrier adjacent the air bearing surface. The deficiency of the constituent is replenished in the portion of the tunnel barrier adjacent the air bearing surface to restore the electrical properties of the tunnel barrier.
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DeVries Cyril Peter
Duxstad Kristin Joy
Edelman Harry Sam
Hoehn Joel William
Kinney & Lange , P.A.
McDonald Rodney G.
Seagate Technology LLC
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