Method of forming a surface micromachined MEMS device

Details Method of forming a surface micromachined MEMS device Method of forming a surface micromachined MEMS device

2011-03-15

2011-03-15

Pizarro, Marcos D. (Department: 2814)

Semiconductor device manufacturing: process

Making device or circuit responsive to nonelectrical signal

Physical stress responsive

C257SE21001

Reexamination Certificate

active

07906359

ABSTRACT:
A method of forming a surface micromachined MEMS device applies an insulator to a substrate, and then deposits a conductive path on the insulator. The conductive path is capable of transmitting an electronic signal between two points on the MEMS device. The insulator electrically isolates the conductive path from the substrate. The MEMS device illustratively is free of semiconductor junctions formed by the substrate and the conductive path.

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