Method of forming a semiconductor layer using a photomask...

Details Method of forming a semiconductor layer using a photomask... Method of forming a semiconductor layer using a photomask...

2004-08-18

2008-10-14

Rosasco, Stephen (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

Reexamination Certificate

active

07435533

ABSTRACT:
A method of forming a semiconductor layer of a semiconductor device including interposing a reticle between an energy source and a semiconductor wafer, the reticle including at least two duplicate mask patterns each having a different bias, and passing energy through an opening in a shutter and through one of the at least two duplicate mask patterns using the energy source to form an image on the semiconductor wafer. The one of the at least two duplicate mask patterns is chosen based on a required bias. The at least two duplicate mask patterns are disposed in a side by side relationship to one another and extend parallel or transverse to the shutter opening.

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Photronics, Inc.: Photomask & Reticle Lithography Solutions, at http://www.photronics.com/about/basics.jsp.

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