Method of forming a plasma micro-undulator

Details Method of forming a plasma micro-undulator Method of forming a plasma micro-undulator

1996-04-18

1998-10-13

Scott, Jr., Leon

Coherent light generators

Free electron laser

372 2, H01S 300

Patent

active

058223428

ABSTRACT:
Undulator is a device which produces a high intensity synchrotron radiation having narrow band width by making a relativistic electron beam undulate in an alternating magnetic field. It is possible to form a plasma micro-undulator which is very compact (size <1 cm) and by which a short-wavelength synchrotron radiation (visible to X-ray) can be produced, by illuminating a variable wavelength laser to a vapor atom generated from a high temperature evaporation source, at that time interfering two laser beams having the same wavelength to form an optical interference fringe and adjusting the wavelength of laser beam to the excitation energy of atom and producing a regular plasma-density-ripple corresponding to the light and shade of optical fringe by the multiple-step ionization scheme (resonance ionization).

REFERENCES:
patent: 5020061 (1991-05-01), Etievany et al.
Bekefi et al; "Stimulated Raman scattering by an intense relativistic electron beam subjected to a rippled electric field";J. Appl. Phys. 50(8),Aug. 1979.

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