Method of forming a photoresist pattern in a semiconductor devic

Details Method of forming a photoresist pattern in a semiconductor devic Method of forming a photoresist pattern in a semiconductor devic

1995-02-03

1996-07-02

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

430311, 430319, 430322, 430394, G03C 500

Patent

active

055321143

ABSTRACT:
A photoresist pattern in a semiconductor device which can form a ultra micro pattern beyond the limitation of the resolution power obtainable by an ordinary stepper. A first, second, third and fourth exposure processes using a first, second, third and fourth photo masks.

REFERENCES:
patent: 5045417 (1991-09-01), Okamoto
patent: 5217830 (1993-06-01), Lowrey
patent: 5308741 (1994-05-01), Kemp
patent: 5407785 (1995-04-01), Leroux

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