Glass manufacturing – Processes of manufacturing fibers – filaments – or preforms – Process of manufacturing optical fibers – waveguides – or...
Reexamination Certificate
2008-06-10
2008-06-10
Hug, Eric (Department: 1791)
Glass manufacturing
Processes of manufacturing fibers, filaments, or preforms
Process of manufacturing optical fibers, waveguides, or...
C385S129000, C065S391000
Reexamination Certificate
active
07383702
ABSTRACT:
Embodiments of the present invention provide a highly uniform low cost production worthy solution for manufacturing low propagation loss optical waveguides on a substrate. In one embodiment, the present invention provides a method of forming a PSG optical waveguide on an undercladding layer of a substrate that includes forming at least one silicate glass optical core on said undercladding layer using a plasma enhanced chemical vapor deposition process including a silicon source gas, an oxygen source gas, and a phosphorus source gas, wherein the oxygen source gas and silicon source gas have a ratio of oxygen atoms to silicon atoms greater than 20:1.
REFERENCES:
patent: 3806223 (1974-04-01), Keck et al.
patent: 4212663 (1980-07-01), Aslami
patent: 4351658 (1982-09-01), Olshansky
patent: 4378987 (1983-04-01), Miller et al.
patent: 4385802 (1983-05-01), Blaszyk et al.
patent: 4425146 (1984-01-01), Izawa et al.
patent: 4528009 (1985-07-01), Sarkar
patent: 4557561 (1985-12-01), Schneider et al.
patent: 4619680 (1986-10-01), Nourshargh et al.
patent: 4856859 (1989-08-01), Imoto
patent: 4932749 (1990-06-01), Haidle et al.
patent: 5059231 (1991-10-01), Ackermann et al.
patent: 5253319 (1993-10-01), Bhagavatula
patent: 5295220 (1994-03-01), Heming et al.
patent: 5369722 (1994-11-01), Heming et al.
patent: 5408569 (1995-04-01), Nishimoto
patent: 5480687 (1996-01-01), Heming et al.
patent: 5904491 (1999-05-01), Ojha et al.
patent: 5932283 (1999-08-01), Kaneyama
patent: 6077764 (2000-06-01), Sugiarto et al.
patent: 6080683 (2000-06-01), Faur et al.
patent: 6109065 (2000-08-01), Atkins et al.
patent: 6122934 (2000-09-01), Narita et al.
patent: 6154582 (2000-11-01), Bazylenko et al.
patent: 6156483 (2000-12-01), McCoy et al.
patent: 6192712 (2001-02-01), Saito et al.
patent: 6194038 (2001-02-01), Rossman
patent: 6204200 (2001-03-01), Shieh et al.
patent: 6207353 (2001-03-01), Armacost et al.
patent: 6261857 (2001-07-01), Alam et al.
patent: 6326325 (2001-12-01), Dawson-Elli et al.
patent: 6408125 (2002-06-01), Akwani et al.
patent: 6451686 (2002-09-01), Ngai et al.
patent: 6614977 (2003-09-01), Johnson et al.
patent: 6618537 (2003-09-01), Temkin et al.
patent: 6705124 (2004-03-01), Zhong et al.
patent: 7080528 (2006-07-01), M'Saad et al.
patent: 2002/0034645 (2002-03-01), Kondo et al.
patent: 2002/0182342 (2002-12-01), Ouellet et al.
patent: 2002/0192393 (2002-12-01), Ouellet et al.
patent: 2003/0068902 (2003-04-01), Wang et al.
patent: 2003/0110808 (2003-06-01), M'Saad et al.
patent: 2003/0113085 (2003-06-01), M'Saad et al.
patent: 2004/0079118 (2004-04-01), M'Saad et al.
patent: 0 659 902 (1995-06-01), None
patent: 0 803 589 (2000-05-01), None
patent: 0 735 160 (2000-08-01), None
patent: 2 312 439 (1996-04-01), None
patent: WO 00/68718 (2000-11-01), None
patent: WO 00/79033 (2000-12-01), None
Bapin et al., “Deposition of SiO2 films from different organosilicon/O2 plasmas under continous wave and pulsed modes”, Surface and Coatings Technology, Jul. 2001, pp. 649-654.
Choi et al., “Effects of process parameters on the growth of thick SiO2 using plasma enhanced chemical vapor deposition with hezamethydisilazane”, Surface and Coatings Technology 131, Sep. 2000, pp. 136-140.
Dominguez et al., “The effect of rapid thermal annealing on properties of plasma enhanced CVD silicon dioxide films”, Thin Film Solids 346, Jun. 1999, pp. 202-206.
Haque et al., Post-deposition processing of low temperature PECVD silicon dioxide films for enhanced stree stability:, Thin Film Solids 308-309, Oct. 1997, pp. 68-73.
Hoffmann, Martin; Kopka, Peter; and Voges, Edgar,Low-Loss Fiber-Matched Low-Temperature PECVD Waveguides with Small-Core Dimensions for Optical Communication Systems, IEEE Photonics Technology Letters, vol. 9, No. 9, Sep. 1997, pp. 1238-1240.
Matthews, Manyalibo J. et al. “Characterization of phosphosilicate thin films using confocal Raman microscopy” Review of Scientific Instruments, May 2000, pp. 2117-2120, vol. 71, No. 5, American Institute of Physics.
Valette, S. et al. “Si-Based Integrated Optics Technologies” Soild State Technology, Feb. 1989, pp. 69-75.
Valette, S. et al. “State of the art of integrated optics technology at LETI for achieving passive optical components” Journal of Modern Optics, 1988, pp. 993-1005, vol. 35, No. 6.
Verbeek, B.H. et al. “Integrated Four-Channel Mach-Zehnder Multi/Demultiplexer Fabricated with Phosphorous Doped SiO2 Waveguides on Si” Journal of Lightwave Technology, Jun. 1988, pp. 1011-1015, vol. 6, No. 6, IEEE.
Wilson et al., Handbook of Multilevel Metallizaiton for Integrated Circuits—Materials, Technology, and Applications, William Andrew Publsihing/Noyes, Copyright 1993, pp 202-232.
Ahn Sang
M'Saad Hichem
Wang Anchuan
Applied Materials Inc.
Hug Eric
Townsend and Townsend and Crew
Wilson DeMaris R.
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