Method of forming a permselective layer

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making named article

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

430311, 430313, 430325, 430326, 430328, 430330, 435288, G03C 500

Patent

active

052120503

ABSTRACT:
A method of forming a permselective layer on preselected areas of a substantially planar sensing device is disclosed. The claimed method includes establishing and confining a liquid film, derived from a silane compound mixed in a suitable solvent, within a predetermined area of the sensing device. The process relates to photolithographic imaging and developing methods coupled to a film-curing step that provides a patterned permselective layer having the desired semipermeable characteristics.

REFERENCES:
patent: 3572400 (1971-03-01), Casner et al.
patent: 3890176 (1975-06-01), Bolon
patent: 4065357 (1977-12-01), Groves
patent: 4073713 (1978-02-01), Newman
patent: 4218298 (1980-08-01), Shimada et al.
patent: 4258001 (1981-03-01), Pierce et al.
patent: 4307181 (1981-12-01), Ganguillet et al.
patent: 4464460 (1984-08-01), Hiroka et al.
patent: 4481049 (1984-11-01), Reichmenis et al.
patent: 4551156 (1985-11-01), Li
patent: 4562157 (1985-12-01), Lowe et al.
patent: 4632901 (1986-12-01), Valkirs et al.
patent: 4634027 (1987-01-01), Kanarvogel
patent: 4671288 (1987-06-01), Gough
patent: 4734184 (1988-03-01), Burleigh et al.
patent: 4759828 (1988-07-01), Young et al.
patent: 4781733 (1988-11-01), Babcock et al.
patent: 4894339 (1990-01-01), Hanazato et al.
Weetall, H. H., Methods Enzymology, 1976 44: 134-149.
Kallury et al., Anal. Chem., 1988, 60: 169-172.
Fujihara et al., J. Electoanal. Chem., 1985, 195: 197-201.
Fujihara et al., Bull. Chim. Soc. Jpn., 1986, 59: 975-980.
Murakami et al., Anal. Letters, 1986, 19: 1973-1986.
Yao T., Analytica Chim. Acta, 1983, 148: 27-33.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method of forming a permselective layer does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of forming a permselective layer, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of forming a permselective layer will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-803599

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.