Method of forming a pattern of metal elements

Details Method of forming a pattern of metal elements Method of forming a pattern of metal elements

1982-06-25

1984-08-07

Smith, John D.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

156643, 204192EC, 204192E, 204192D, 427 89, 427 90, 427131, 427132, 430314, 430315, 430318, 430319, H01L 2118

Patent

active

044644590

ABSTRACT:
A method of forming a pattern of metal elements arranged with very small gaps therebetween on a substrate in magnetic bubble memory devices, semiconductor devices, and the like. In this method, first, a pattern forming layer having metal portions adapted for forming pattern elements and insulating portions for providing the gaps is formed on the substrate, and thereafter the pattern forming layer is processed by using a photolithograhic technique to form the pattern. By using this method, it is possible to form a permalloy propagation pattern with gaps of a size smaller than 1 .mu.m in a magnetic bubble memory device, for example, by using conventional photolithograhic techniques.

REFERENCES:
patent: 4251319 (1981-02-01), Bonnie
patent: 4321284 (1982-03-01), Yakushiji
patent: 4356210 (1982-10-01), Imai
patent: 4376137 (1983-03-01), Gergis

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