Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Patent
1984-05-02
1986-09-30
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
430 8, 430167, 430194, 430197, 430296, 430320, 430323, 430325, 156643, G03F 726, H01L 2130, C23F 108
Patent
active
046147063
ABSTRACT:
A film of a photoresist having phenolic hydroxyl groups is irradiated with far-ultraviolet radiation, and is thereafter developed with an alkaline aqueous solution. Using as a mask a resist pattern thus obtained, dry etching is carried out to form a microscopic pattern. Since the photoresist is highly immune against the dry etching, the microscopic pattern can be formed at a high precision. By adding an azide of a specified structure, the photoresist has its sensitivity to the far-ultraviolet radiation enhanced more.
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Douta Kikuo
Iwayanagi Takao
Kohashi Takahiro
Matsuzawa Toshiharu
Nonogaki Saburo
Bowers Jr. Charles L.
Hitachi , Ltd.
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