Method of forming a mask pattern for a semiconductor device

Details Method of forming a mask pattern for a semiconductor device Method of forming a mask pattern for a semiconductor device

2006-11-28

2009-06-09

Young, Christopher G (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S030000, C716S030000

Reexamination Certificate

active

07544447

ABSTRACT:
A method of forming a mask pattern from a design pattern. A method may effectively compensate for pattern distortion resulting from an optical proximity effect (OPE). A method may obtain a precise line width. A method includes a first mask design processing and a second mask design processing.

REFERENCES:
patent: 6263299 (2001-07-01), Aleshin et al.
patent: 6472108 (2002-10-01), Lin

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