Method of forming a low capacitance semiconductor device and...

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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Details

C257S315000, C257S341000, C257S390000, C257S401000, C257S620000, C257SE29027, C257SE29121, C257SE29257

Reexamination Certificate

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07851852

ABSTRACT:
In one embodiment a transistor is formed with a gate structure having an opening in the gate structure. An insulator is formed on at least sidewalls of the opening and a conductor is formed on the insulator.

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patent: 2004/0108547 (2004-06-01), Venkatraman
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patent: 01-111378 (1989-04-01), None

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