Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Patent
1996-11-22
1999-12-14
Duda, Kathleen
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
430324, G03F 726
Patent
active
060015373
ABSTRACT:
A method for patterning an insulative layer with high precision to accommodate the pitch reduction of wiring conductors and forming insulating layers that are superior in insulation performance, migration resistance, etc. is disclosed. According to the method, there are provided a first step of forming a pattern having openings on a surface by using a high resolution material, a second step of forming an insulating layer of a reliable second insulating material in spaces between the residual first resist material and a third step of removing the residual resist material. The pattern formation is preferably performed by using an ultraviolet-curable resin, to form a precision pattern. Since a highly reliable, thermosetting resin remains on the substrate in an actual product, superior properties of migration resistance and adhesiveness with the substrate can be obtained.
REFERENCES:
patent: 5053318 (1991-10-01), Gulla
patent: 5149615 (1992-09-01), Chakravorty
patent: 5158860 (1992-10-01), Gulla
patent: 5266446 (1993-11-01), Chang
Ohsumi Kouichi
Takagi Toshiaki
Cutter Lawrence D.
Duda Kathleen
International Business Machines - Corporation
Soucar Steven J.
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