Method of forming a layer and method of removing reaction...

Details Method of forming a layer and method of removing reaction... Method of forming a layer and method of removing reaction...

2006-10-31

2010-10-26

Vinh, Lan (Department: 1713)

Coating processes

Coating by vapor, gas, or smoke

C427S585000, C117S102000, C117S105000, C117S106000, C117S103000, C438S680000, C438S681000, C438S685000

Reexamination Certificate

active

07820244

ABSTRACT:
In a method of forming a layer, a titanium layer and a titanium nitride layer may be successively formed on a first wafer. By-products adhered to the inside of a chamber during the formation of the titanium nitride layer may be removed from the chamber. Processes of forming the titanium layer, forming the titanium nitride layer, and removing the by-products may be repeated relative to a second wafer.

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