Method of forming a III-nitride selective current carrying...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having schottky gate

Reexamination Certificate

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C257S192000, C257S194000, C257S472000, C257SE29246, C257SE29252, C257SE29253, C257SE21403, C257SE21407, C257SE21409, C438S167000, C438S179000, C438S180000, C438S182000

Reexamination Certificate

active

08043906

ABSTRACT:
A III-nitride device includes a recessed electrode to produce a nominally off, or an enhancement mode, device. By providing a recessed electrode, a conduction channel formed at the interface of two III-nitride materials is interrupted when the electrode contact is inactive to prevent current flow in the device. The electrode can be a schottky contact or an insulated metal contact. Two ohmic contacts can be provided to form a rectifier device with nominally off characteristics. The recesses formed with the electrode can have sloped sides. The electrode can be formed in a number of geometries in conjunction with current carrying electrodes of the device. A nominally on device, or pinch resistor, is formed when the electrode is not recessed. A diode is also formed by providing non-recessed ohmic and schottky contacts through an insulator to an AlGaN layer.

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Lindholm et al., Unified Modeling of Field-Effect Devices, IEEE Journal of Solid-State Circuits, vol. SC-6, No. 4 (Aug. 1971), pp. 250-259.

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