Method of forming a fine pattern

Details Method of forming a fine pattern Method of forming a fine pattern

1988-08-22

1991-07-16

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

430317, G03C 500

Patent

active

050324918

ABSTRACT:
A photoresist is coated on a substrate to form a planar surface, thus to form a recessed portions corresponding to a mask of a pattern to be formed in the photoresist layer having planar surface. SiO.sub.2 etc. are deposited into the recessed portions to prepare a mask, thus to form a fine pattern by anisotropic etching. As a result, by films remaining below the recessed portions formed in the photoresist layer having planar surface, a fine pattern is formed.

REFERENCES:
patent: 4599137 (1986-07-01), Akiya
patent: 4634645 (1987-01-01), Matsuda et al.
patent: 4707218 (1987-11-01), Giammarco et al.
patent: 4732658 (1988-03-01), Lee
H. Watanabe "Submicron Feature Patterning Using Spin-On Glass Image Reversal (Sogir)"; 1046 Journal of the Electrochemical Society; 134 (1987)Mar., No. 3, Abstract No. 168.

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