Method of forming a film of predetermined pattern on a...

Details Method of forming a film of predetermined pattern on a... Method of forming a film of predetermined pattern on a...

2006-08-29

2006-08-29

Coleman, W. David (Department: 2823)

Semiconductor device manufacturing: process

Introduction of conductivity modifying dopant into...

Diffusing a dopant

Reexamination Certificate

active

07098121

ABSTRACT:
An object is to provide a mask formation method, which can curtail a manufacturing cost.A method of forming a film of predetermined pattern on the front surface of a member to-be-processed is so constructed as to carry out the step (S178) of improving the adherence of a pattern material solution to the member to-be-processed, the step (S180) of filling up a pattern forming recess provided in a mask on the surface of the member to-be-processed with a pattern material solution, the step (S186) of improving the film quality of the pattern film to-be-formed by processing the pattern material solution, the step (S188) of removing the pattern material solution having adhered on the mask, the step (S190) of drying the pattern material solution, and the step (S196) of subjecting the pattern film to annealing processing.

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Merriam-Webster's Colegiate Dictionary, 10thedition, 2001, pp. 994.

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