Metal working – Method of mechanical manufacture – Electrical device making
Reexamination Certificate
2005-08-23
2005-08-23
Arbes, Carl J. (Department: 3729)
Metal working
Method of mechanical manufacture
Electrical device making
C029S825000, C029S832000, C029S846000, C336S083000, C336S192000, C336S200000
Reexamination Certificate
active
06931712
ABSTRACT:
A dielectric substrate having an embedded inductor wherein each turn of the inductor traverses several layers such that the top and bottom of each turn of the inductor are parallel to each other but are in different layers and the sides of each turn of the inductor traverse at least one layer to connect the top and bottom of the inductor.
REFERENCES:
patent: 3614554 (1971-10-01), Shield et al.
patent: 3731005 (1973-05-01), Shearman
patent: 3812442 (1974-05-01), Muckelroy
patent: 4543553 (1985-09-01), Mandai et al.
patent: 5032815 (1991-07-01), Kobayashi et al.
patent: 5302932 (1994-04-01), Person et al.
patent: 5389428 (1995-02-01), Fleming et al.
patent: 5392019 (1995-02-01), Ohkubo
patent: 5610569 (1997-03-01), Hwang et al.
patent: 5884990 (1999-03-01), Burghartz et al.
patent: 5945902 (1999-08-01), Lipkes et al.
patent: 6008102 (1999-12-01), Alford et al.
patent: 6008151 (1999-12-01), Sasaki et al.
patent: 6104272 (2000-08-01), Yamamoto et al.
patent: 6147573 (2000-11-01), Kumagai et al.
patent: 6160469 (2000-12-01), Liberatore et al.
patent: 6189200 (2001-02-01), Takeuchi et al.
patent: 6292086 (2001-09-01), Chu
patent: 6459352 (2002-10-01), Liu et al.
patent: 06-119386 (1994-05-01), None
IBM Technical Disclosure Bulletin, vol. 29, No. 2, Jul. 1986 entitled, “Method Of Fabricating Deflection Coils For Electron Lithography Systems”.
Bhatia Harsaran S.
Hamel Harvey Charles
Long David Clifford
Pillai Edward R.
Setzer Christopher David
Arbes Carl J.
Blecker Ira D.
LandOfFree
Method of forming a dielectric substrate having a multiturn... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method of forming a dielectric substrate having a multiturn..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of forming a dielectric substrate having a multiturn... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3455570