Coating processes – Direct application of electrical – magnetic – wave – or... – Pretreatment of substrate or post-treatment of coated substrate
Patent
1994-08-31
1997-08-12
Pianalto, Bernard
Coating processes
Direct application of electrical, magnetic, wave, or...
Pretreatment of substrate or post-treatment of coated substrate
427123, 427265, 427402, 427535, 427576, 427578, 427579, H05H 100
Patent
active
056563370
ABSTRACT:
A deposition rate of a dielectric material is varied with the electrical polarity of an underlying layer to obtain excellent deposition and planarization characteristics. A conductive layer and the underlying dielectric are surface-treated to have different electrical polarities so that the dielectric is formed by using the difference of deposition rates of the dielectric material between that on the conductive layer and that on the underlying dielectric. A CVD apparatus having a DC power source connected between a susceptor and a gas injection portion thereof is provided. The deposition and planarization can be performed at low temperatures and are simplified in process.
Chung U-In
Hong Chang-Gee
Kim Chang-Gyu
Lee Myoung-Bum
Park In-Seon
Pianalto Bernard
Samsung Electronics Co,. Ltd.
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