Method of fabrication of a microfluidic device

Details Method of fabrication of a microfluidic device Method of fabrication of a microfluidic device

2007-08-28

2007-08-28

Hassanzadeh, Parviz (Department: 1763)

Etching a substrate: processes

Etching of semiconductor material to produce an article...

Reexamination Certificate

active

10440515

ABSTRACT:
The present invention relates to a method of fabricating a microfluidic device including at least two substrates provided with a fluid channel, comprising the steps of:a) etching at least a channel and one or more fluid ports in a first and/or a second substrate;b) depositing a first layer on a surface of the second substrate;c) partially removing the first layer in accordance with a predefined geometry;d) depositing a second layer on top of the first layer and the substrate surface;e) planarizing the second layer so as to smooth the upper surface thereof;f) aligning the first and second substrate;g) bonding the first substrate on the planarized second layer of the second substrate.

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