Method of fabricating thin-film magnetic head

Metal working – Method of mechanical manufacture – Electrical device making

Patent

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Details

360126, 427131, 427132, G11B 542

Patent

active

053497457

ABSTRACT:
A method of fabricating a thin-film magnetic in which a mask pattern in etching a bottom pole is formed of first and second mask films in this order when viewed from the bottom pole, the first mask film is used for defining, by self-alignment, the length of that portion of the side edge of a top pole which is nearly perpendicular to a magnetic gap, the second mask film makes it possible to etch the bottom pole with high dimensional accuracy, a non-magnetic film is formed on the mask pattern having the bottom pole thereunder and the exposed region of a substrate, and the top pole is formed after the mask pattern has been exposed and removed.

REFERENCES:
patent: 5116719 (1992-05-01), Gau
patent: 5137750 (1992-08-01), Amin et al.

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