Method of fabricating solar cells

Details Method of fabricating solar cells Method of fabricating solar cells

1990-07-17

1991-04-30

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156644, 156653, 156657, 156662, 21912169, 21912185, 437 4, 437228, H01L 71306, B44C 122, C03C 1500, C03C 2506

Patent

active

050115677

ABSTRACT:
A method of forming a metallization pattern on a solar cell substrate having an outer layer of a selected dielectric such as silicon nitride, silicon dioxide, or glass, by removing selected portions of the dielectric layer with a laser beam. This laser exposure drives portions of the P/N junction positioned beneath the exposed regions of the substrate more deeply into the substrate. Removal of selected portions of the dielectric layer exposes regions of the silicon substrate on which conductors may be deposited by conventional immersion plating methods. This laser removal of the dielectric layer is effected in an environment substantially free of chemical etching substances. Following removal of the selected portions of the dielectric layer, the substrate is preferably immersed in a buffered oxide etch solution to remove residual silicon dioxide and is then preferably immersed in a high ratio (nitric acid to hydrofluoric acid) etch solution to remove residual silicon nitride. The method of forming a metallization pattern may be incorporated into a comprehensive solar cell fabrication process.

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Green et al., "Improvements in Flat-Plate and Concentrator Silicon Cell Efficiency", IEEE, 1987, pp. 49-52.

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