Method of fabricating reflection-mode EUV diffusers

Details Method of fabricating reflection-mode EUV diffusers Method of fabricating reflection-mode EUV diffusers

2005-03-01

2005-03-01

Smith, Matthew (Department: 2825)

Semiconductor device manufacturing: process

Making device or circuit emissive of nonelectrical signal

Including integrally formed optical element

C438S022000, C438S029000, C438S032000, C430S005000, C430S322000, C216S002000, C216S041000, C359S360000, C359S572000

Reexamination Certificate

active

06861273

ABSTRACT:
Techniques for fabricating well-controlled, random relief, engineered surfaces that serve as substrates for EUV optical devices are accomplished with grayscale exposure. The method of fabricating a multilevel EUV optical element includes: (a) providing a substrate; (b) depositing a layer of curable material on a surface of the substrate; (c) creating a relief profile in a layer of cured material from the layer of curable material wherein the relief profile comprises multiple levels of cured material that has a defined contour; and (d) depositing a multilayer reflection film over the relief profile wherein the film has an outer contour that substantially matches that of the relief profile. The curable material can comprise photoresist or a low dielectric constant material.

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