Method of fabricating probe for SPM having FET channel...

Details Method of fabricating probe for SPM having FET channel... Method of fabricating probe for SPM having FET channel...

2006-03-07

2006-03-07

Dang, Phuc T. (Department: 2818)

Semiconductor device manufacturing: process

Making device or circuit responsive to nonelectrical signal

C438S666000

Reexamination Certificate

active

07008811

ABSTRACT:
Provided is a method of fabricating a probe for a scanning probe microscope (SPM) having a field effect transistor (FET) channel structure utilizing a self-aligned fabrication. The provided method includes a first step of forming a first-shaped mask layer on a substrate and forming a source region and a drain region in regions of the substrate except for the mask layer; a second step of patterning a first-shaped photoresist in a perpendicular direction to the mask layer and performing an etching process to form a second-shaped mask layer; and a third step of etching the regions of the substrate except for the mask layer to form a probe. The provided method aligns the center of a tip with the center of a channel existing between the source region and the drain region to realize a tip having a size of tens of nanometers. Thus, a nano-device can be easily manufactured using the probe having the tip.

REFERENCES:
patent: 5618760 (1997-04-01), Soh et al.
patent: 6022797 (2000-02-01), Ogasawara et al.
patent: 6521921 (2003-02-01), Lim et al.
patent: 8-86788 (1996-04-01), None
patent: 2001-45981 (2001-06-01), None

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